Dr. LEI Xinjian from Air Products and Chemicals(APC), USA, visited Fujian Institute of Research on the Structure of Matter (FJIRSM) at the invitation of the State Key Laboratory of Structural Chemistry on July 23rd，2010. During his stay, Dr. LEI delivered a seminar report entitled “Designing Volatile Metal Complexes as ALD Precursors for High k Applications” and carried out detailed discussion with the research staff of FJIRSM.

Dr. LEI got his B.S. with the major of macromolecular chemistry from Jilin University in 1985, M.S. with the major of physical chemistry from Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences in 1988; and his Ph. D. with the major of inorganic chemistry from the University of Notre Dame under the supervision of Prof. Thoms P. Fehlner in 1997; Currently, his research efforts are synthetic chemistry and CVD/ALD processes for copper diffusion barrier, copper metallization, high k materials for capacitors as well as low k materials for interconnects with more than 85 publications in peer-reviewed journals such as J. Am. Chem. Soc., Angewandte Chemie International Edition, Chem. Commun., Inorg. Chem., Organometallics, and Journal of Physical Chemistry C; Up to now he has submitted over 20 US patent applications.